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CF-HJ High Purity Silicon Nitride Powder

The silicon nitride ceramic substrate boasts numerous advantages, such as high strength, high toughness, and exceptional thermal conductivity (130W/(m-k)).Furthermore, its thermal expan sion coefficient closely matches that of Si, SiC, and GaN semiconductors.Consequently, the silicon nitride ceramic substrate is an ideal choice for packaging high-power modules, making it widely regarded as the most suitable ceramic substrate option.

Our company utilizes the direct nitridation process to produce high-purity silicon powder. Through our unique patented technology, we control the silicon material, nitriding process, and refining process to prepare CF-HJ silicon nitride powder with high purity, a high a phase content, a narrow particle size distribution, and exceptional sintering activity. This type of silicon nitride powder has effectively terminated foreign monopolies and can serve as a fully viable substitute for imported silicon nitride powder of the same quality level.

Technical Specifications

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Test item

Unit

Index range

Testing equipment or method

α phase

%

≥90

X-ray diffractometer    

 JC/T 2342-2015    

Fe

ppm

≤200

Atomic absorption method

ISO10058-3:2008

Al

ppm

≤200

Ca

ppm

≤200

N

%

≥38.5

Kjeldahl nitrogen apparatus

GB/T 16555-2017

Frss Si

%

<0.2

Gas volumetric methpd

GB/T 16555-2017

C

%

≤0.10

High frequmency infrared carbon analyzer

GB/T 16555-2017

D50

μm

≤0.9

Laser particle size analyzer

GB/T19077-2016

O

%

≤1.4

Inert gas pulse infrared thermal conductivity method

GB/T 16555-2017

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